Optical Characterization of Nickel Sulphide Thin Films Prepared by Chemical Bath Deposition Method
Journal of Energy Research and Reviews, Volume 14, Issue 1,
Page 33-38
DOI:
10.9734/jenrr/2023/v14i1276
Abstract
Nickel sulfide thin films were prepared using chemical bath deposition method on a glass substrate. Nickel sulphate and sodium thiosulphate were used as starting chemicals. Ethylenediaminetetra-acetic acid (EDTA), was used as the complexing agent. In this study time was the only parameter optimized to get good quality thin film. Films were characterized using an UV M501 single beam scanning spectrophotometer from a wavelength of 220- 560nm. The nickel sulfide thin films exhibited direct band gap transition with band gap energy 2.3eV. A poor reflectance, moderate absorbance and high transmittance was recorded.
- Nickel sulfide [NiS] thin film
- chemical bath deposition
- Band gap
- complexing agent
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References
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